Dopant Implantation into a Semiconductor, Lecture 27
The purpose of this mini-lecture is to provide the viewer with a physical basis for understanding how dopants are implanted at depth inside a semiconductor using ion beams. Here is the link for my entire course on "Semiconductor Devices for VLSI" that I taught during Fall 2020 https://www.youtube.com/playlist?list=PLmfHzApbF5dYnZTqPDsJj31mOQtD7vDT2 This is Lecture 27 of 77. Any textbook references are to the free e-book "Modern Semiconductor Devices for Integrated Circuits" by Chenming Calvin Hu. https://www.chu.berkeley.edu/modern-semiconductor-devices-for-integrated-circuits-chenming-calvin-hu-2010/ #IonImplantation #SemiconductorDoping
The purpose of this mini-lecture is to provide the viewer with a physical basis for understanding how dopants are implanted at depth inside a semiconductor using ion beams. Here is the link for my entire course on "Semiconductor Devices for VLSI" that I taught during Fall 2020 https://www.youtube.com/playlist?list=PLmfHzApbF5dYnZTqPDsJj31mOQtD7vDT2 This is Lecture 27 of 77. Any textbook references are to the free e-book "Modern Semiconductor Devices for Integrated Circuits" by Chenming Calvin Hu. https://www.chu.berkeley.edu/modern-semiconductor-devices-for-integrated-circuits-chenming-calvin-hu-2010/ #IonImplantation #SemiconductorDoping